Fabrication of PDMS soft stamps for nanoimprint lithography (NIL)
DOI:
https://doi.org/10.58368/MTT.23.5-6.2024.13-18Keywords:
Polydimethylsiloxane (PDMS), Nanoimprint Lithography (NIL), Micro-Engineering, Soft Lithography, Soft StampsAbstract
Polydimethylsiloxane (PDMS) elastomers are widely utilized for replicating microstructures in microfluidic and micro-engineering applications using. This study presents a method for fabricating polydimethylsiloxane (PDMS) soft stamps utilized for nanoimprint lithography (NIL). PDMS is favoured due to its mechanical properties, ease of fabrication, and compatibility with various substrates. The study investigates the fabrication process, challenges regarding durability, and implications for pattern fidelity in NIL applications and assess the quality of these stamps based on pattern accuracy and replication precision showcasing their possible uses in nanotechnology and microfabrication. The results indicate that PDMS soft stamp demonstrates excellent flexibility and conformability, enabling effective imprinting onto various substrates which can be used as a feasible option for scalable and cost-efficient NIL procedures.
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